A study of electron field emission as a function of film thickness from amorphous carbon films
نویسندگان
چکیده
The electron field-emission properties of hydrogenated amorphous carbon and nitrogenated tetrahedral amorphous carbon thin films are examined by measuring the field-emission current as a function of the applied macroscopic electric field. The experimental results indicate the existence of an optimum film thickness for low-threshold electron field emission. The predictions of various emission models are compared to the experimental results. © 1998 American Institute of Physics. @S0003-6951~98!03351-8#
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